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Proceedings Paper

Refractive index profiling of planar optical waveguides using near-field scanning optical microscopy
Author(s): Lisa Dhar; H. J. Lee; E. J. Laskowski; Steve K. Buratto; Chellappan Narayanan; Herman M. Presby; Charles C. Bahr; Phillip J. Anthony; Mark J. Cardillo
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Paper Abstract

The refractive index profile of a straight channel phosphosilicate glass planar optical waveguide is obtained with high spatial resolution (approximately 0.25 micrometers ) using near- field scanning optical microscopy (NSOM). The optical intensity profile of the waveguide mode is measured by NSOM and the refractive index distribution is calculated from the measured intensity. The calculated refractive index distribution is in agreement with that expected from the fabrication procedure and provides evidence for phosphorous diffusion between the core and cladding regions.

Paper Details

Date Published: 6 September 1995
PDF: 5 pages
Proc. SPIE 2535, Near-Field Optics, (6 September 1995); doi: 10.1117/12.218696
Show Author Affiliations
Lisa Dhar, AT&T Bell Labs. (United States)
H. J. Lee, AT&T Bell Labs. (United States)
E. J. Laskowski, AT&T Bell Labs. (United States)
Steve K. Buratto, Univ. of Puget Sound (United States)
Chellappan Narayanan, AT&T Bell Labs. (United States)
Herman M. Presby, AT&T Bell Labs. (United States)
Charles C. Bahr, AT&T Bell Labs. (United States)
Phillip J. Anthony, AT&T Bell Labs. (United States)
Mark J. Cardillo, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 2535:
Near-Field Optics
Michael A. Paesler; Patrick J. Moyer, Editor(s)

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