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Proceedings Paper

Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction
Author(s): Richard D. Deslattes; E. G. Kessler
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Paper Abstract

Optical determination of the spatial period of monocrystalline silicon is a first step toward such diverse goals as an atom-based replacement for the artifact kilogram, reckoning the masses of certain elementary particles, and measurement of the molar Planck constant. The needed measurements are realized through microfringe interferometric precision with a presently achievable accuracy of the order ot 0.01 ppm. Application of such subnanometer standards to x-ray and particulary gamma-ray wavelength measurement requires accurate interferometric angle measurement nowadays effective at the sub-milli-arcsecond level. From results obtained to date, one can infer certain constraints on the future direction of subpicometer interferometry and sub-milli-arcsecond goniometry.

Paper Details

Date Published: 6 September 1995
PDF: 11 pages
Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); doi: 10.1117/12.218683
Show Author Affiliations
Richard D. Deslattes, National Institute of Standards and Technology (United States)
E. G. Kessler, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 2542:
Optomechanical and Precision Instrument Design
Alson E. Hatheway, Editor(s)

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