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Proceedings Paper

Aspheric surface figuring of silicon using plasma-assisted chemical etching
Author(s): Steven J. Hoskins; Bradley A. Scott
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Paper Abstract

OCA Applied Optics has developed and demonstrated a rapid, automated technique for the surface figuring of precision aspheric silicon and silicon-clad optical elements using a patented plasma assisted chemical etching (PACE) methodology. In this paper we discuss the preprocessing methods and suitable PACE removal depth strategies to ensure that final PACE- finished silicon surfaces meet current low-scatter optical standards. An aspheric surface figuring model for the PACE process is also described.

Paper Details

Date Published: 6 September 1995
PDF: 5 pages
Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); doi: 10.1117/12.218670
Show Author Affiliations
Steven J. Hoskins, OCA Applied Optics (United States)
Bradley A. Scott, OCA Applied Optics (United States)

Published in SPIE Proceedings Vol. 2542:
Optomechanical and Precision Instrument Design
Alson E. Hatheway, Editor(s)

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