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Proceedings Paper

Deposition of composite materials using a wire-bar coater for achieving processability and air-stability in Organic Field-Effect Transistors (OFETs)
Author(s): Freddy G. Del Pozo; Sergi Galindo; Raphael Pfattner; Concepció Rovira; Marta Mas-Torrent
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Paper Abstract

Organic thin films based on composite materials of semiconducting dibenzo-tetrathiafulvalene (DB-TTF) and insulating styrenic matrices (Polystyrene (PS10k) and Poly-alpha methylstyrene (PAMS10k) ) have been fabricated by the wire-bar coating technique in ambient conditions (air, light, humidity) and contrasted with the ones prepared by thermally evaporating the organic semiconductor. The transistors fabricated with DB-TTF:PS10k composites show a clear fieldeffect behavior with p-type characteristics, exhibiting charge carriers mobilities in the range of 0.01 cm2/Vs, fully comparable with the films obtained by thermal evaporation. However, while the thermally evaporated films show poor stability in air, the wire-bar coated composites films and devices are highly reproducible and exhibit lower threshold voltage values. Thus, we demonstrate the suitability of the wire-bar technique for manufacturing large area devices.

Paper Details

Date Published: 31 August 2015
PDF: 6 pages
Proc. SPIE 9568, Organic Field-Effect Transistors XIV; and Organic Sensors and Bioelectronics VIII, 95680D (31 August 2015); doi: 10.1117/12.2186521
Show Author Affiliations
Freddy G. Del Pozo, Institut de Ciència de Materials de Barcelona (Spain)
CIBER-BBN (Spain)
Sergi Galindo, Institut de Ciència de Materials de Barcelona (Spain)
CIBER-BBN (Spain)
Raphael Pfattner, Institut de Ciència de Materials de Barcelona (Spain)
CIBER-BBN (Spain)
Concepció Rovira, Institut de Ciència de Materials de Barcelona (Spain)
CIBER-BBN (Spain)
Marta Mas-Torrent, Institut de Ciència de Materials de Barcelona (Spain)
CIBER-BBN (Spain)


Published in SPIE Proceedings Vol. 9568:
Organic Field-Effect Transistors XIV; and Organic Sensors and Bioelectronics VIII
Ioannis Kymissis; Iain McCulloch; Ruth Shinar; Oana D. Jurchescu; Luisa Torsi, Editor(s)

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