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Proceedings Paper

Laser-induced damage of SiO2 and CaF2 under 263 nm
Author(s): Xiuqing Jiang; Dong Liu; Lailin Ji; Shunxing Tang; Yajing Guo; Baoqiang Zhu; Yanqi Gao; Zunqi Lin
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Paper Abstract

Laser damage performance of large aperture optical components has been study under fourth harmonic of 1053nm Nd:glass laser irradiation (263nm).The threshold of optical components is very low under 263nm laser irradiation ,due to conversion of beam to higher energy photons of the quadrupled frequency (4ω), and is relative to material characteristic. A preliminary test of laser induced damage in fused silica (SiO2) and CaF2under 263nm laser is reported in this article. Thresholds of these two materials are obtained. Laser damage threshold of SiO2 is found about 2 J/cm2 by 1-on-1 method using pulsed 263nm laser, lower than CaF2 whose threshold.

Paper Details

Date Published: 14 July 2015
PDF: 8 pages
Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95320C (14 July 2015); doi: 10.1117/12.2186012
Show Author Affiliations
Xiuqing Jiang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Dong Liu, Shanghai Institute of Laser Plasma (China)
Lailin Ji, Shanghai Institute of Laser Plasma (China)
Shunxing Tang, Shanghai Institute of Optics and Fine Mechanics (China)
Yajing Guo, Shanghai Institute of Optics and Fine Mechanics (China)
Baoqiang Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Yanqi Gao, Shanghai Institute of Laser Plasma (China)
Zunqi Lin, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9532:
Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers
Jianda Shao; Takahisa Jitsuno; Wolfgang Rudolph; Meiping Zhu, Editor(s)

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