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Proceedings Paper

Study of hafina-silica mixed coatings with different compositions prepared by E-beam co-evaporation
Author(s): Huanbin Xing; Meiping Zhu; Yingjie Chai; Feifei Tu; Hu Wang; Kui Yi; Jianda Shao
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Paper Abstract

Hafnia-silica (HfO2/SiO2) mixed thin films with a wide range of different compositions have been deposited on fused silica substrate by E-beam co-evaporation. The change in composition is achieved by changing the deposition rates of individual materials. The transmittance spectra are measured by the spectrometer, and then the refractive indexes are calculated with Essential Macleod. The vertical uniformity and grain structure of the films are analyzed by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The experimental results demonstrate that the coatings have good uniformity, and all the films are amorphous except the pure HfO2 film. In addition, the mixed coating with about 16.85% SiO2 content has a higher refractive index than the pure HfO2 coating.

Paper Details

Date Published: 14 July 2015
PDF: 6 pages
Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 953226 (14 July 2015); doi: 10.1117/12.2185981
Show Author Affiliations
Huanbin Xing, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Yingjie Chai, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Feifei Tu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Hu Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9532:
Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers
Jianda Shao; Takahisa Jitsuno; Wolfgang Rudolph; Meiping Zhu, Editor(s)

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