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Proceedings Paper

How laser damage resistance of HfO2/SiO2 optical coatings is affected by embedded contamination caused by pausing the deposition process
Author(s): Ella Field; John Bellum; Damon Kletecka
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Paper Abstract

Reducing contamination is essential for producing optical coatings with high resistance to laser damage. One aspect of this principle is to make every effort to limit long interruptions during the coating’s deposition. Otherwise, contamination may accumulate during the pause and become embedded in the coating after the deposition is restarted, leading to a lower laser-induced damage threshold (LIDT). However, pausing a deposition is sometimes unavoidable, despite our best efforts. For example, a sudden hardware or software glitch may require hours or even overnight to solve. In order to broaden our understanding of the role of embedded contamination on LIDT, and determine whether a coating deposited under such non-ideal circumstances could still be acceptable, this study explores how halting a deposition overnight impacts the LIDT, and whether ion cleaning can be used to mitigate any negative effects on the LIDT. The coatings investigated are a beam splitter design for high reflection at 1054 nm and high transmission at 527 nm, at 22.5° angle of incidence in S-polarization. LIDT tests were conducted in the nanosecond regime.

Paper Details

Date Published: 14 July 2015
PDF: 10 pages
Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95320J (14 July 2015); doi: 10.1117/12.2185739
Show Author Affiliations
Ella Field, Sandia National Labs. (United States)
John Bellum, Sandia National Labs. (United States)
Damon Kletecka, Sandia National Labs. (United States)


Published in SPIE Proceedings Vol. 9532:
Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers
Jianda Shao; Takahisa Jitsuno; Wolfgang Rudolph; Meiping Zhu, Editor(s)

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