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Proceedings Paper

Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography
Author(s): L. D'Urzo; P. Foubert; H. Stokes; Y. Thouroude; A. Xia; Aiwen Wu
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Paper Abstract

Negative tone development (NTD) has dramatically gained popularity in 193 nm dry and immersion lithography, due to their superior imaging performance [1, 2 and 3].

Popular negative tone developers are organic solvents such as n- butyl acetate (n-BA), aliphatic ketones, or high-density alcohols such as Methyl Isobutyl Carbinol (MIBC). In this work, a comparative study between ultra-high molecular weight polyethylene (UPE) and polytetrafluoroethylene (PTFE) POU filtration for n-BA based NTD has been carried out.

Results correlate with the occurrence or the mitigation of micro bridges in a 45 nm dense line pattern created through immersion lithography as a function of POU membrane.

Paper Details

Date Published: 20 March 2015
PDF: 6 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251J (20 March 2015); doi: 10.1117/12.2185599
Show Author Affiliations
L. D'Urzo, Entegris GmbH (Germany)
P. Foubert, IMEC (Belgium)
H. Stokes, Dainippon Screen Deutschland GmbH (Germany)
Y. Thouroude, Dainippon Screen Deutschland GmbH (Belgium)
A. Xia, Entegris, Inc. (United States)
Aiwen Wu, Entegris, Inc. (United States)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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