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Proceedings Paper

Testing multilayer-coated polarizing mirrors for the LAMP soft X-ray telescope
Author(s): D. Spiga; B. Salmaso; R. She; K. Tayabaly; M. Wen; R. Banham; E. Costa; H. Feng; A. Giglia; Q. Huang; F. Muleri; G. Pareschi; P. Soffitta; G. Tagliaferri; G. Valsecchi; Z. Wang
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Paper Abstract

The LAMP (Lightweight Asymmetry and Magnetism Probe) X-ray telescope is a mission concept to measure the polarization of X-ray astronomical sources at 250 eV via imaging mirrors that reflect at incidence angles near the polarization angle, i.e., 45 deg. Hence, it will require the adoption of multilayer coatings with a few nanometers dspacing in order to enhance the reflectivity. The nickel electroforming technology has already been successfully used to fabricate the high angular resolution imaging mirrors of the X-ray telescopes SAX, XMM-Newton, and Swift/XRT. We are investigating this consolidated technology as a possible technique to manufacture focusing mirrors for LAMP. Although the very good reflectivity performances of this kind of mirrors were already demonstrated in grazing incidence, the reflectivity and the scattering properties have not been tested directly at the unusually large angle of 45 deg. Other possible substrates are represented by thin glass foils or silicon wafers. In this paper we present the results of the X-ray reflectivity campaign performed at the BEAR beamline of Elettra - Sincrotrone Trieste on multilayer coatings of various composition (Cr/C, Co/C), deposited with different sputtering parameters on nickel, silicon, and glass substrates, using polarized X-rays in the spectral range 240 - 290 eV.

Paper Details

Date Published: 2 October 2015
PDF: 11 pages
Proc. SPIE 9603, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII, 96031B (2 October 2015); doi: 10.1117/12.2185432
Show Author Affiliations
D. Spiga, INAF - Osservatorio Astronomico di Brera (Italy)
B. Salmaso, INAF - Osservatorio Astronomico di Brera (Italy)
R. She, Tsinghua Univ. (China)
K. Tayabaly, INAF - Osservatorio Astronomico di Brera (Italy)
Politecnico di Milano (Italy)
M. Wen, Tongji Univ. (China)
R. Banham, Media Lario Technologies (Italy)
E. Costa, INAF - Istituto di Astrofisica e Planetologia Spaziali (Italy)
H. Feng, Tsinghua Univ. (China)
A. Giglia, TASC-INFM National Lab. (Italy)
Q. Huang, Tongji Univ. (China)
F. Muleri, INAF - Istituto di Astrofisica e Planetologia Spaziali (Italy)
G. Pareschi, INAF - Osservatorio Astronomico di Brera (Italy)
P. Soffitta, INAF - Istituto di Astrofisica e Planetologia Spaziali (Italy)
G. Tagliaferri, INAF - Osservatorio Astronomico di Brera (Italy)
G. Valsecchi, Media Lario Technologies (Italy)
Z. Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 9603:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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