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Proceedings Paper

In-line digital holography with double knife edge
Author(s): Claudio Ramirez; Claudio Iemmi; Juan Campos
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Paper Abstract

We study and test a new technique for in-line digital holography which avoids the formation of the conjugate images. Inline digital holography is based in a common path configuration. In this case, the hologram is produced by the interference between the reference wave front and the diffracted wave front by an almost transparent object. Twin images are obtained with obscured rings that difficult the determination of the best focusing plane. To avoid the conjugated image, the information of the magnitude and phase of the wave front are needed.

In a recent work a new in-line digital holography technique was proposed. In this method the object is illuminated with a collimated wave front. A plane, close to the particles distribution is imaged onto a CCD by means of a convergent lens and at the same time, a knife edge is placed in the focal plane of the lens in order to block half of spatial frequency spectrum. In this way, by means of a numerical processing performed on the Fourier plane, it is possible to eliminate one of the components (real or conjugate) of the reconstructed images nevertheless it is observed a tiny deformation of the resulting hologram image.

To compensate this effect, we propose a new configuration in which we implement the knife edge technique on both parts of the spectrum at the same time. Finally in the computer, we process the holograms to build one complete without deformation. This hologram is used to recover the wave front at different planes without the influence of the conjugate image.

Paper Details

Date Published: 21 June 2015
PDF: 8 pages
Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 952611 (21 June 2015); doi: 10.1117/12.2184799
Show Author Affiliations
Claudio Ramirez, Univ. Autónoma de Barcelona (Spain)
Claudio Iemmi, Univ. de Buenos Aires (Argentina)
Juan Campos, Univ. Autònoma de Barcelona (Spain)

Published in SPIE Proceedings Vol. 9526:
Modeling Aspects in Optical Metrology V
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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