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Proceedings Paper

Correction of depolarization effect in Mueller matrix ellipsometry with polar decomposition method
Author(s): Weiqi Li; Chuanwei Zhang; Hao Jiang; Xiuguo Chen; Honggang Gu; Shiyuan Liu
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Paper Abstract

Mueller matrix ellipsometry has been demonstrated as a powerful tool for nanostructure metrology in high-volume manufacturing. Many factors may induce depolarization effect in the Mueller matrix measurement, and consequently, may lead to accuracy loss in the nanostructure metrology. In this paper, we propose to apply a Mueller matrix decomposition method for the Mueller matrix measurement to separate the depolarization effect caused by the MME system. The method is based on the polar decomposition by decomposing the measured depolarizing Mueller matrix into a sequence of three matrices corresponding to a diattenuator followed by a retarder and a depolarizer. Since the depolarization effects will be only reflected in the depolarizer matrix, the other two matrices are used to extract the structure parameters of the measured sample. Experiments performed on a one-dimensional silicon grating structure with an in-house developed MME layout have demonstrated that the proposed method achieves a higher accuracy in the nanostructure metrology.

Paper Details

Date Published: 21 June 2015
PDF: 8 pages
Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 952619 (21 June 2015); doi: 10.1117/12.2184786
Show Author Affiliations
Weiqi Li, Huazhong Univ. of Science and Technology (China)
Chuanwei Zhang, Huazhong Univ. of Science and Technology (China)
Wuhan Eoptics Technology Co., Ltd. (China)
Hao Jiang, Huazhong Univ. of Science and Technology (China)
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Honggang Gu, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Wuhan Eoptics Technology Co., Ltd. (China)


Published in SPIE Proceedings Vol. 9526:
Modeling Aspects in Optical Metrology V
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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