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Proceedings Paper

A way for measuring the relationship between DM surface and wave-front aberrations in a beam rotate-90° laser system
Author(s): Ping Yang; Ming-Wu Ao; Shuai Wang; Lizhi Dong; Yi Tan
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Paper Abstract

Adaptive optics (AO) schemes are often applied to the inertial confinement fusion (ICF) system, such as SG-Ⅲ Prototype which has been set in China. This laser systm mainly includes a pulsed seed laser source, a multi-pass laser amplifier with the configuration of beam rotate-90° and expansion. When AO system is employed in this sytem, the beam bounces twice on the deformable mirror (DM) which works as the cavity mirror (CM) of the multi-pass laser amplifier, moreover, after the first bounce on the DM, the beam rotate 90° and expansion with a ratio. Therefore, the relationship between the DM’s correction stroke and the aberrations within the laser sytem must be known before applying a adaptive correction. This paper demonstrates that any output wave-front aberrations within the DM’s correction stroke range can be well corrected, as well as illuminates that the expansion ratio of beam and the types of output wave-front aberrations both affect the correction stroke range of DM. Furthermore, through building a theoretical calculating model and some simulation. the relationship between the DM’s surface stroke needed and different aberrations within the laser sytem is ascertained clearly. Results show that this configuration is proper for compensting most low order aberrtions besides some special ones. As a result, it will provides a useful guidance for those rotate-90°laser systems adopting adaptive optics technique.

Paper Details

Date Published: 21 June 2015
PDF: 9 pages
Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 95260C (21 June 2015); doi: 10.1117/12.2184781
Show Author Affiliations
Ping Yang, Institute of Optics and Electronics (China)
The Key Lab. of Adaptive Optics (China)
Ming-Wu Ao, Institute of Optics and Electronics (China)
The Key Lab. of Adaptive Optics (China)
Shuai Wang, Institute of Optics and Electronics (China)
The Key Lab. of Adaptive Optics (China)
Lizhi Dong, Institute of Optics and Electronics (China)
The Key Lab. of Adaptive Optics (China)
Yi Tan, Institute of Optics and Electronics (China)
The Key Lab. of Adaptive Optics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 9526:
Modeling Aspects in Optical Metrology V
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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