Share Email Print
cover

Proceedings Paper

Development of Mueller matrix imaging scatterometry for nanostructure metrology
Author(s): Xiuguo Chen; Weichao Du; Chuanwei Zhang; Hao Jiang; Shiyuan Liu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 952618; doi: 10.1117/12.2184773
Show Author Affiliations
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Weichao Du, Huazhong Univ. of Science and Technology (China)
Chuanwei Zhang, Huazhong Univ. of Science and Technology (China)
Hao Jiang, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 9526:
Modeling Aspects in Optical Metrology V
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

© SPIE. Terms of Use
Back to Top