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Proceedings Paper

Surface topography measurement based on color images processing in white light interferometry
Author(s): Tong Guo; Yue Gu; Jinping Chen; Xing Fu; Xiaotang Hu
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Paper Abstract

Microstructure surface topography is a key aspect of micro-nano measuring research for it has an obvious influence on the performance and quality of micro-nano devices. Scanning white light interferometry is a common method of testing surface profiling. In this paper, a color CCD camera, rather than a black-and-white CCD camera, was utilized to acquire white light interference images, which contain information of RGB channels. Based on acquired color interference images, wavelet transform method was employed to calculate phase value of corresponding channel in each scanning position. Then zero-optical-path-difference positions were accurately determined via a constructed evaluation function and least square method. Surface topography was eventually obtained via linear relationship of relative height and the zero-optical-path-difference position. The proposed method was verified by simulation and experiment of measuring standard step provided by VLSI Standards Incorporated.

Paper Details

Date Published: 22 June 2015
PDF: 9 pages
Proc. SPIE 9525, Optical Measurement Systems for Industrial Inspection IX, 952511 (22 June 2015); doi: 10.1117/12.2184558
Show Author Affiliations
Tong Guo, Tianjin Univ. (China)
Yue Gu, Tianjin Univ. (China)
Jinping Chen, Tianjin Univ. (China)
Xing Fu, Tianjin Univ. (China)
Xiaotang Hu, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 9525:
Optical Measurement Systems for Industrial Inspection IX
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves, Editor(s)

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