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Proceedings Paper

Effect of focus position of ns pulse laser on damage characteristics of K9 glass
Author(s): Yunxiang Pan; Hongchao Zhang; Mengmeng Li; Zhonghua Shen; Jian Lu; Xiaowu Ni
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Paper Abstract

Laser-induced damage of optical glasses has been investigated for more than fifty years. Due to the residual scratches, inclusions and other forms of defects at surfaces of optical glasses after the processes of grinding and polishing, it is well known that the sample surface can be damaged more easily than bulk. In order to get the relationship between the damage threshold and the location of the laser spot, we carried out damage experiments on K9 glasses with a 7ns pulse laser. Since ns pulse laser-induced damage of optical glasses always accompanies with the generation of the plasma, a optical microscope connected with a CCD camera was used to observe the plasma flash, which can provide a real time detection of damage sites. The laser pulse was first focused into the bulk, then the spot was moved toward the direction of incident laser beam step by step until the beam was completely focused in ambient air. Damage threshold curves were measured for each focus position, and low thresholds and high thresholds were extracted from those curves. Finally, the relationship between damage thresholds and focus position was analyzed.

Paper Details

Date Published: 4 May 2015
PDF: 7 pages
Proc. SPIE 9543, Third International Symposium on Laser Interaction with Matter, 95430O (4 May 2015); doi: 10.1117/12.2183474
Show Author Affiliations
Yunxiang Pan, Nanjing Univ. of Science and Technology (China)
Hongchao Zhang, Nanjing Univ. of Science and Technology (China)
Mengmeng Li, Nanjing Univ. of Science and Technology (China)
Zhonghua Shen, Nanjing Univ. of Science and Technology (China)
Jian Lu, Nanjing Univ. of Science and Technology (China)
Xiaowu Ni, Nanjing Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 9543:
Third International Symposium on Laser Interaction with Matter
Yury M. Andreev; Zunqi Lin; Xiaowu Ni; Xisheng Ye, Editor(s)

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