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Proceedings Paper

Application of optical scattering in multichip module processing
Author(s): Meirong Tu; Yang Xu; Peter J. Gielisse; Igor F. Kulisic
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Paper Abstract

The impact of surface characterization on various aspects of microelectronic device performance and manufacture is briefly reviewed. Optical scattering measurements have been carried out for the surface characterization of AlN, MgO, Al2O3 substrates, single crystal silicon wafers and physcial vapor deposited films. Scattering light was recorded up to 80 degree from the specular direction. The angle-resolved scattered light sensitively reveals the characteristics of surface in the spatial frequency domain. Quantitative parameters of surface roughness have been derived from power spectral density distributions and diffraction theory for highly polished smooth surfaces. Instrumentation for full surface characterization has been coupled with computer operation. It has the features of high-speed and noncontact and is inherently area averaging. It lends itself particularly well to online product of high- speed and inprocess monitoring of a manufacturing process. Delicate surfaces can be rapidly 'finger printed'.

Paper Details

Date Published: 1 September 1995
PDF: 12 pages
Proc. SPIE 2541, Optical Scattering in the Optics, Semiconductor, and Computer Disk Industries, (1 September 1995); doi: 10.1117/12.218341
Show Author Affiliations
Meirong Tu, Florida A&M Univ. and Florida State Univ. (United States)
Yang Xu, Florida A&M Univ. and Florida State Univ. (United States)
Peter J. Gielisse, Florida A&M Univ. and Florida State Univ. (United States)
Igor F. Kulisic, Florida A&M Univ. and Florida State Univ. (United States)


Published in SPIE Proceedings Vol. 2541:
Optical Scattering in the Optics, Semiconductor, and Computer Disk Industries
John C. Stover, Editor(s)

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