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Proceedings Paper

Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation
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Paper Abstract

X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μm focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.

Paper Details

Date Published: 12 May 2015
PDF: 7 pages
Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); doi: 10.1117/12.2182778
Show Author Affiliations
Takahisa Koyama, Japan Synchrotron Radiation Research Institute (Japan)
Hirokatsu Yumoto, Japan Synchrotron Radiation Research Institute (Japan)
Kensuke Tono, Japan Synchrotron Radiation Research Institute (Japan)
Tadashi Togashi, Japan Synchrotron Radiation Research Institute (Japan)
Yuichi Inubushi, Japan Synchrotron Radiation Research Institute (Japan)
Tetsuo Katayama, Japan Synchrotron Radiation Research Institute (Japan)
Jangwoo Kim, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Makina Yabashi, RIKEN (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Haruhiko Ohashi, Japan Synchrotron Radiation Research Institute (Japan)


Published in SPIE Proceedings Vol. 9511:
Damage to VUV, EUV, and X-ray Optics V
Libor Juha; Saša Bajt; Richard London, Editor(s)

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