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Proceedings Paper

Pulsed UV and ultrafast laser micromachining of surface structures
Author(s): Paul Apte; Neil Sykes
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Paper Abstract

We describe and compare the cutting and patterning of various “difficult” materials using pulsed UV Excimer, picosecond and femtosecond laser sources. Beam delivery using both fast galvanometer scanners and scanning mask imaging are described. Each laser source has its own particular strengths and weaknesses, and the optimum choice for an application is also decided by financial constraints. With some materials notable improvements in process quality have been observed using femtosecond lasers compared to picosecond lasers, which makes for an interesting choice now that cost effective reliable femtosecond systems are increasingly available. By contrast Pulsed UV Excimer lasers offer different imaging characteristics similar to mask based Lithographic systems and are particularly suited to the processing of polymers. We discuss optimized beam delivery techniques for these lasers.

Paper Details

Date Published: 1 July 2015
PDF: 9 pages
Proc. SPIE 9657, Industrial Laser Applications Symposium (ILAS 2015), 96570D (1 July 2015); doi: 10.1117/12.2182418
Show Author Affiliations
Paul Apte, Rideo Systems Ltd. (United Kingdom)
Neil Sykes, Micronanics Ltd., Rutherford Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 9657:
Industrial Laser Applications Symposium (ILAS 2015)
Mike Green; Cath Rose, Editor(s)

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