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Proceedings Paper

Passive protective strategy for ultra-precision dual-stage
Author(s): Yang Liu; Zhenyu Chen; Zhenxian Fu
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Paper Abstract

In order to improve the throughput of lithography machine, a new type of lithography machine began to adopt double wafer stages which make the exposure and measurement work simultaneously. But at the same time, this structure also increases the risk greatly, the wafer stage collision for instance. Therefore, a corresponding safety protection system is necessary to protect the whole double wafer stages system and to improve the throughput on the premise of safety. In this paper, a passive safety protection strategy for double-stages lithography machine is proposed based on analysis of its working conditions. The design principle of safety needle is elaborated, and then needle distribution is determined correspondingly. The simulation results show that, the proposed passive protection method carried out by safety needles could avoid damages of sensitive apparatus.

Paper Details

Date Published: 6 March 2015
PDF: 6 pages
Proc. SPIE 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation, 94464X (6 March 2015); doi: 10.1117/12.2182389
Show Author Affiliations
Yang Liu, Harbin Institute of Technology (China)
Zhenyu Chen, Harbin Institute of Technology (China)
Zhenxian Fu, Harbin Institute of Technology (China)

Published in SPIE Proceedings Vol. 9446:
Ninth International Symposium on Precision Engineering Measurement and Instrumentation
Junning Cui; Jiubin Tan; Xianfang Wen, Editor(s)

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