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Proceedings Paper

Evaluation of surface and bulk qualities of semiconductor materials by a laser-induced photothermal technique
Author(s): Jingtao Dong; Jian Chen; Shiwen Sun; Dawei Zhang; Songlin Zhuang; Zhouling Wu
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Paper Abstract

Non-destructive evaluation of defects for semiconductor materials is critical to the quality control process. The existing evaluation methods, including radiographic testing, ultrasonic detection, fluorescence and infrared imaging, are widely used in industrial applications. In this paper an instrument based on laser-induced photothermal technique was applied to study various semiconductor materials. With a specially arranged pump-probe configuration, this system can do three dimensional mapping of local properties and defects. By using this photothermal instrument, several semiconductors, such as bulk CdZnTe (CZT) crystals and monocrystalline silicon wafers under different processing conditions, were investigated. The surface and internal structures and defects of these materials were tested nondestructively by the 3-D photothermal microscope. The results show intersting correlation between the photothermal characterizations and the processing conditions. In addition, the details of the development of the 3-D photothermal microscope were also presented. The system provides user-friendly operations of the defects characterization process and shows great potential of application for characterization of semiconductor materials.

Paper Details

Date Published: 4 May 2015
PDF: 8 pages
Proc. SPIE 9543, Third International Symposium on Laser Interaction with Matter, 95431B (4 May 2015); doi: 10.1117/12.2182237
Show Author Affiliations
Jingtao Dong, ZC Optoelectronic Technologies, Ltd. (China)
Jian Chen, ZC Optoelectronic Technologies, Ltd. (China)
Shiwen Sun, Shanghai Institute of Technical Physics (China)
Dawei Zhang, Univ. of Shanghai for Science and Technology (China)
Songlin Zhuang, Univ. of Shanghai for Science and Technology (China)
Zhouling Wu, ZC Optoelectronic Technologies, Ltd. (China)
Univ. of Shanghai for Science and Technology (China)

Published in SPIE Proceedings Vol. 9543:
Third International Symposium on Laser Interaction with Matter
Yury M. Andreev; Zunqi Lin; Xiaowu Ni; Xisheng Ye, Editor(s)

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