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Proceedings Paper

355nm and 1064nm laser damage of quartz glass
Author(s): Xun Gao; Qi Li; Haijun Chi; Jingquan Lin
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Paper Abstract

In this paper, the laser damage thresholds of the quartz glass with/without HF acid etching are investigated induced by the wavelength of the 355nm and 1064nm respectively. Laser-induced damage threshold of the quartz glass can be improved by optimizing the HF concentration and etched time. The experimental results shown that laser induced damage thresholds of quartz glass for 355nm and 1064nm were 7.1×108 W/cm2 and 1.15×109 W/cm2 respectively, after HF acid treatment with the 10% HF concentration and etched time 15 minutes, laser induced damage thresholds of quartz glass for 355nm changed to 1.29×109 W/cm2 and improved 81.7%, while for 1064nm changed to 1.73×109 W/cm2 and improved 50.4%. The surface damage morphologies of quartz glass induced by the 355nm and 1064nm with/without HF acid etching were comparative analyzed. Finally, the laser induced damaged mechanisms of quartz glass for 355nm and 1064nm were given.

Paper Details

Date Published: 4 May 2015
PDF: 5 pages
Proc. SPIE 9543, Third International Symposium on Laser Interaction with Matter, 95430K (4 May 2015); doi: 10.1117/12.2182011
Show Author Affiliations
Xun Gao, Changchun Univ. of Science and Technology (China)
Qi Li, Changchun Univ. of Science and Technology (China)
Haijun Chi, Changchun Univ. of Science and Technology (China)
Jingquan Lin, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 9543:
Third International Symposium on Laser Interaction with Matter
Yury M. Andreev; Zunqi Lin III; Xiaowu Ni; Xisheng Ye, Editor(s)

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