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Proceedings Paper

Atomic layer deposition of Al2O3 on NF3-pre-treated graphene
Author(s): Marcel Junige; Tim Oddoy; Rositsa Yakimova; Vanya Darakchieva; Christian Wenger; Grzegorz Lupina; Julia Kitzmann; Matthias Albert; Johann W. Bartha
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Paper Abstract

Graphene has been considered for a variety of applications including novel nanoelectronic device concepts. However, the deposition of ultra-thin high-k dielectrics on top of graphene has still been challenging due to graphene's lack of dangling bonds. The formation of large islands and leaky films has been observed resulting from a much delayed growth initiation. In order to address this issue, we tested a pre-treatment with NF3 instead of XeF2 on CVD graphene as well as epitaxial graphene monolayers prior to the Atomic Layer Deposition (ALD) of Al2O3. All experiments were conducted in vacuo; i. e. the pristine graphene samples were exposed to NF3 in the same reactor immediately before applying 30 (TMA-H2O) ALD cycles and the samples were transferred between the ALD reactor and a surface analysis unit under high vacuum conditions. The ALD growth initiation was observed by in-situ real-time Spectroscopic Ellipsometry (irtSE) with a sampling rate above 1 Hz. The total amount of Al2O3 material deposited by the applied 30 ALD cycles was cross-checked by in-vacuo X-ray Photoelectron Spectroscopy (XPS). The Al2O3 morphology was determined by Atomic Force Microscopy (AFM). The presence of graphene and its defect status was examined by in-vacuo XPS and Raman Spectroscopy before and after the coating procedure, respectively.

Paper Details

Date Published: 1 June 2015
PDF: 9 pages
Proc. SPIE 9519, Nanotechnology VII, 951915 (1 June 2015); doi: 10.1117/12.2181242
Show Author Affiliations
Marcel Junige, Technische Univ. Dresden (Germany)
Tim Oddoy, Technische Univ. Dresden (Germany)
Rositsa Yakimova, Linköping Univ. (Sweden)
Vanya Darakchieva, Linköping Univ. (Sweden)
Christian Wenger, IHP GmbH (Germany)
Grzegorz Lupina, IHP GmbH (Germany)
Julia Kitzmann, IHP GmbH (Germany)
Matthias Albert, Technische Univ. Dresden (Germany)
Johann W. Bartha, Technische Univ. Dresden (Germany)


Published in SPIE Proceedings Vol. 9519:
Nanotechnology VII
Ion M. Tiginyanu, Editor(s)

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