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Proceedings Paper

Precisely connected and calculated algorithm of punctate scratches in the super-smooth surface defects evaluation system
Author(s): Chen Li; Yongying Yang; Pin Cao; Shitong Wang; Dong Liu; Lu Li; Lu Yan; Yang Li; Shibing Xie; Yangjie Chen
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Paper Abstract

In the inertial confinement fusion system (ICF), surface scratches of the large diameter optical surface appear as dot lines (punctate scratches). This kind of scratches is only detected under a high microscope magnification system. This can be caused by the blemishes on the optical processing technology and shallow scratches (< 25nm ). As a result, it can have an impact on the relevant calculation of the width and length of the scratches. Besides, this kind of scratches has a serious impact on the ICF, such as system damage. To solve this problem, this paper proposes the image pattern charter of punctate scratches based on the existing surface defects detection system (SDES). Finally, it proposes an algorithm of scratches based on the linearity differential detection and connectivity. That is, using coordinate transformation and direction differential-threshold discrimination, the scratches can be connected effectively and calculated exactly. Experimental results show that punctate scratches parts can be connected correctly, and the accuracy of the calculated length reaches 95%. Also, the improved algorithm applies to the arc-shaped scratches, which is based the block image processing. Currently, this algorithm can be applied to connect and calculate the shallow scratches accurately and precisely on large fine optics in the ICF system. Thus it can also decrease the misdetection rate of nonconforming super-smooth optics in the ICF system.

Paper Details

Date Published: 6 March 2015
PDF: 7 pages
Proc. SPIE 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation, 94462S (6 March 2015); doi: 10.1117/12.2181189
Show Author Affiliations
Chen Li, Zhejiang Univ. (China)
Yongying Yang, Zhejiang Univ. (China)
Pin Cao, Zhejiang Univ. (China)
Shitong Wang, Zhejiang Univ. (China)
Dong Liu, Zhejiang Univ. (China)
Lu Li, Zhejiang Univ. (China)
Lu Yan, Zhejiang Univ. (China)
Yang Li, Zhejiang Univ. (China)
Hangzhou Zernike Optical Technology Co., Ltd. (China)
Shibing Xie, Zhejiang Univ. (China)
Hangzhou Zernike Optical Technology Co., Ltd. (China)
Yangjie Chen, Hangzhou Zernike Optical Technology Co., Ltd. (China)

Published in SPIE Proceedings Vol. 9446:
Ninth International Symposium on Precision Engineering Measurement and Instrumentation
Junning Cui; Jiubin Tan; Xianfang Wen, Editor(s)

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