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Proceedings Paper

Study of growth kinetics of amorphous carbon nanopillars formed by PECVD
Author(s): D. Gromov; N. Borgardt; Y. Grishina; A. Dedkova; E. Kirilenko; S. Dubkov
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Paper Abstract

In this paper we study the process of plasma enhanced chemical vapor deposition (PECVD) of carbon nanostructures in the form of a film, the pillars, the flakes at a temperature of 100-350 °C from the vapor-gas mixture H2+CO+Ar. Also in the paper presents the structural features of the carbon nanopillars obtained at 250 °C. Determined mechanical stresses occurring during the growth of carbon nanostructures. Investigated the features of the growth of carbon pillars and proposed a phenomenological description of the process of their formation during PECVD process.

Paper Details

Date Published: 18 December 2014
PDF: 9 pages
Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400D (18 December 2014); doi: 10.1117/12.2179765
Show Author Affiliations
D. Gromov, National Research Univ. of Electronic Technology (Russian Federation)
N. Borgardt, National Research Univ. of Electronic Technology (Russian Federation)
Y. Grishina, National Research Univ. of Electronic Technology (Russian Federation)
A. Dedkova, Science-Technological Ctr. Nano- and Microsystems technics (Russian Federation)
E. Kirilenko, Science-Technological Ctr. Nano- and Microsystems technics (Russian Federation)
S. Dubkov, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 9440:
International Conference on Micro- and Nano-Electronics 2014
Alexander A. Orlikovsky, Editor(s)

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