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Proceedings Paper

Modification of cantilevers for atomic-force microscopy using the method of exposure defocused ion beam
Author(s): S. P. Antonov; S. Yu. Krasnoborodko; S. A. Smagulova; Y. A. Chaplygin; V. I. Shevyakov
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Paper Abstract

This work is focused on investigation of the tips sharpening process with the use of defocused ion beam. The group of cantilevers was placed on silicon substrate. It was established that the method enables the simultaneous sharpening of silicon cantilevers tips placed on 200-mm diameter Si substrates. The current work provides information about efficiency of the modified cantilevers.

Paper Details

Date Published: 18 December 2014
PDF: 8 pages
Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400O (18 December 2014); doi: 10.1117/12.2179243
Show Author Affiliations
S. P. Antonov, North-Eastern Federal Univ. in Yakutsk (Russian Federation)
S. Yu. Krasnoborodko, ND-MDT Co. (Russian Federation)
S. A. Smagulova, North-Eastern Federal Univ. in Yakutsk (Russian Federation)
Y. A. Chaplygin, National Research Univ. of Electronic Technology (Russian Federation)
V. I. Shevyakov, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 9440:
International Conference on Micro- and Nano-Electronics 2014
Alexander A. Orlikovsky, Editor(s)

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