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Proceedings Paper

Aluminum anodization process modeling approach
Author(s): Alexey N. Belov; Maksim I. Vorobiev; Sergey A. Gavrilov; Vasiliy I. Shevyakov
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Paper Abstract

We propose approach for modeling thin aluminum film anodization in three dimensions using variation of coupled lattice map on volumetric grid, which is capable of capturing porous and nonporous aluminum oxide growth and electrochemical polishing modes. Model derivation is based on Parkhutik and Shershulsky understandings. Numerical simulation results for various initial conditions are shown and compared to experimental data.

Paper Details

Date Published: 18 December 2014
PDF: 8 pages
Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400Z (18 December 2014); doi: 10.1117/12.2179218
Show Author Affiliations
Alexey N. Belov, National Research Univ. of Electronic Technology (Russian Federation)
Maksim I. Vorobiev, National Research Univ. of Electronic Technology (Russian Federation)
Sergey A. Gavrilov, National Research Univ. of Electronic Technology (Russian Federation)
Vasiliy I. Shevyakov, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 9440:
International Conference on Micro- and Nano-Electronics 2014
Alexander A. Orlikovsky, Editor(s)

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