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Proceedings Paper

Low-stress coatings for sputtered-sliced Fresnel zone plates and multilayer Laue lenses
Author(s): Stefan Braun; Adam Kubec; Peter Gawlitza; Maik Menzel; Andreas Leson
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Paper Abstract

The application of thin film coating processes for the fabrication of diffractive X-ray optical elements like sputteredsliced zone plates or multilayer Laue lenses (MLL) is a very promising approach for X-ray focusing down to spot sizes of < 10 nm. However, for practical useful focal length in the order of several millimeters or a few centimeters, multilayer thicknesses of several 10 μm up to a few 100 μm are necessary in order to have large enough numerical apertures of the lenses. Currently one of the main challenges is to coat low-stress multilayers with large total thicknesses in the order of 100 μm. Usually sputter deposition results in thin films with significant compressive stress. With new material combinations such as Mo/MoSi2/Si/MoSi2 and W/WSi2/Si/WSi2 the overall stress can be reduced to almost zero if the individual thicknesses are properly adapted. In the case of these four-layer-systems only the period thickness dp follows the zone plate law. In case of Mo/MoSi2/Si/MoSi2, stress-free multilayers are obtained with dMo = 0.5*dp, dMoSi2 = 0.16*dp and dSi = 0.34*dp.

Paper Details

Date Published: 12 May 2015
PDF: 9 pages
Proc. SPIE 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV, 95100L (12 May 2015); doi: 10.1117/12.2178851
Show Author Affiliations
Stefan Braun, Fraunhofer IWS Dresden (Germany)
Adam Kubec, Fraunhofer IWS Dresden (Germany)
Peter Gawlitza, Fraunhofer IWS Dresden (Germany)
Maik Menzel, Fraunhofer IWS Dresden (Germany)
Andreas Leson, Fraunhofer IWS Dresden (Germany)


Published in SPIE Proceedings Vol. 9510:
EUV and X-ray Optics: Synergy between Laboratory and Space IV
René Hudec; Ladislav Pina, Editor(s)

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