Share Email Print
cover

Proceedings Paper

Development of XUV multilayer gratings with high resolution and high efficiency
Author(s): Xiaowei Yang; Qiushi Huang; Igor V. Kozhevnikov; Zhanshan Wang; Jun Zhao; Yanqing Wu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We present a short review of our activities carried out in Tongji University (Shanghai, China) in the field of theory and technology of soft X-ray multilayer diffraction gratings. Diffraction gratings are widely used to study the structure and dynamics of a matter in laboratory and space by spectral analysis techniques. Combining multilayer and grating structures into a single unit allows to increase essentially both the spectral resolution and the efficiency of the diffraction optics. The unified analytical theory of soft X-ray diffraction from multilayer gratings operating in the single-order regime is briefly discussed. The single-order regime occurs when incident wave excites the only diffraction order and it is characterized by ultimately high diffraction efficiency tending to the reflectivity of conventional multilayer mirror. Our first experiments in fabrication of the blazed multilayer gratings by anisotropic etching of a silicon crystal with small roughness of the facet surfaces are described.

Paper Details

Date Published: 12 May 2015
PDF: 8 pages
Proc. SPIE 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV, 95100Y (12 May 2015); doi: 10.1117/12.2178843
Show Author Affiliations
Xiaowei Yang, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Igor V. Kozhevnikov, A.V. Shubnikov Institute of Crystallography (Russian Federation)
Zhanshan Wang, Tongji Univ. (China)
Jun Zhao, Shanghai Institute of Applied Physics (China)
Yanqing Wu, Shanghai Institute of Applied Physics (China)


Published in SPIE Proceedings Vol. 9510:
EUV and X-ray Optics: Synergy between Laboratory and Space IV
René Hudec; Ladislav Pina, Editor(s)

© SPIE. Terms of Use
Back to Top