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Proceedings Paper

Etch aware EPE correction: the critical path toward multipatterning control
Author(s): Kaidong Xu
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Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV, 94280R; doi: 10.1117/12.2178329
Show Author Affiliations
Kaidong Xu, IMEC (Belgium)


Published in SPIE Proceedings Vol. 9428:
Advanced Etch Technology for Nanopatterning IV
Qinghuang Lin; Sebastian U. Engelmann; Ying Zhang, Editor(s)

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