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Proceedings Paper

Sub-aperture EUV collector with dual-wavelength spectral purity filter
Author(s): Torsten Feigl; Marco Perske; Hagen Pauer; Tobias Fiedler; Uwe Zeitner; Robert Leitel; Hans-Christoph Eckstein; Philipp Schleicher; Sven Schröder; Marcus Trost; Stefan Risse; Ralf Steinkopf; Frank Scholze; Christian Laubis
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Paper Abstract

The combination of a 10.6 μm main pulse CO2 laser and a 1064 nm pre-pulse Nd:YAG laser in EUV source concepts for HVM would require collector mirrors with an integrated spectral purity filter that suppresses both laser wavelengths. This paper discusses a new approach of a dual-wavelength spectral purity filter to suppress 10.6 μm and 1064 nm IR radiation at the same time. The dual-wavelength spectral purity filter combines two binary phase gratings that are optimized for 10.6 μm and 1064 nm, respectively. The dual phase grating structure has been realized on spherical sub-aperture EUV collector mirrors having an outer diameter of 150 mm. IR suppression factors of 260 at 10.6 μm and 620 at 1064 nm have been measured on the sub-aperture EUV collector while its EUV reflectance exceeded 64 % at 13.5 nm.

Paper Details

Date Published: 16 March 2015
PDF: 7 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220E (16 March 2015); doi: 10.1117/12.2175666
Show Author Affiliations
Torsten Feigl, optiX fab GmbH (Germany)
Marco Perske, optiX fab GmbH (Germany)
Hagen Pauer, optiX fab GmbH (Germany)
Tobias Fiedler, optiX fab GmbH (Germany)
Uwe Zeitner, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Robert Leitel, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Hans-Christoph Eckstein, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Philipp Schleicher, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Sven Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Marcus Trost, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Stefan Risse, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Ralf Steinkopf, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Christian Laubis, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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