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Proceedings Paper

HVM readiness of nanoimprint lithography templates: defects, CD, and overlay
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Paper Abstract

Performances of the nanoimprint lithography templates were discussed considering the readiness toward the high volume manufacturing of nanoimprint lithography application along with the requirement for the templates and its fabrication process. The current status of the three major performances of the templates was shown.

Paper Details

Date Published: 19 March 2015
PDF: 5 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230D (19 March 2015); doi: 10.1117/12.2175483
Show Author Affiliations
Koji Ichimura, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Saburo Harada, Dai Nippon Printing Co., Ltd. (Japan)
Takaharu Nagai, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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