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Proceedings Paper

Formation of V1-xWx02 thermochromic films by reactive magnetron sputtering with an alloy target
Author(s): Ping Jin; Kazuki Yoshimura; S. Iwama; Sakae Tanemura
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Paper Abstract

The transition temperature (tau) c of the V1-xWxO2 films deposited by dual-target sputtering was precisely determined from the changes both in IR transmittance and in electrical resistivity against temperature. The relationship between x (0-0.026) in V1-xWxO2 and (tau) c(0-67 degree(s)C) in the most applicable range for window coatings was clarified and a confirmed. The V1-xWxO2 films containing the desired tungsten doping amount were fabricated with reproducibility by sputtering of a V-W(1.6at.%) alloy target under optimal conditions. The (tau) c reduction efficiency for the films deposited using alloy target is almost identical of that for the films deposited by dual-target sputtering. The V1-xWxO2 films deposited using alloy target showed thermochroism comparative to those previously prepared by dual-target sputtering.

Paper Details

Date Published: 23 August 1995
PDF: 9 pages
Proc. SPIE 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV, (23 August 1995); doi: 10.1117/12.217358
Show Author Affiliations
Ping Jin, National Industrial Research Institute of Nagoya (Japan)
Kazuki Yoshimura, National Industrial Research Institute of Nagoya (Japan)
S. Iwama, Daido Institute of Technology (Japan)
Sakae Tanemura, National Industrial Research Institute of Nagoya (Japan)


Published in SPIE Proceedings Vol. 2531:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV
Carl M. Lampert; Satyen K. Deb; Claes-Goeran Granqvist, Editor(s)

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