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Proceedings Paper

Planar waveguide fabrication by electron beam bombardment of silica
Author(s): James M. Kubik; A. M. Ali; David B. Patterson
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Paper Abstract

We describe a new fabrication technology for silica-based integrated optical components that employs electron irradiation to modify the refractive index of an amorphous SiO2 substrate. An asymmetric planar waveguide has been fabricated with this method, with a guide depth of approximately 5 micrometers and a core-cladding index difference on the order of 10-3. The guide is single-moded over the entire visible spectrum, exhibiting losses of less than 12 dB/cm.

Paper Details

Date Published: 18 August 1995
PDF: 5 pages
Proc. SPIE 2622, Optical Engineering Midwest '95, (18 August 1995); doi: 10.1117/12.216796
Show Author Affiliations
James M. Kubik, Illinois Institute of Technology (United States)
A. M. Ali, Illinois Institute of Technology (United States)
David B. Patterson, Illinois Institute of Technology (United States)


Published in SPIE Proceedings Vol. 2622:
Optical Engineering Midwest '95
Rudolph P. Guzik, Editor(s)

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