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Proceedings Paper

Macro lens for emission microscopy
Author(s): Paul E. Nothnagle; John Robert Zinter; Paul L. Ruben
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Paper Abstract

Emission microscopy involves post-mortem analysis of integrated circuits. By applying an electric signal to faulty chips, infra-red emission occurs at sites of potential failure. The ability to examine entire chips has not been fully incorporated into the objective design of emission microscopes. This ability allows faster identification of trouble points. After failure-sites have been identified, they are more closely investigated by using higher power microscope objectives. A 0.8X lens having an numerical aperture of the object of 0.32 is discussed. This lens covers an object full field of view of 18.0 X 18.0 mm (diagonal of 25.5 mm) at 50% vignetting, reaching 25 X 25 mm (diagonal 35 mm) at 100% vignetting. Unique features include a 20 mm working distance for the insertion of analytic probes, a 100 mm gap between objective and decollimating lens groups for mounting issues, and a back focal length of 50 mm for introduction of filters, beam splitters and/or other auxiliary optics.

Paper Details

Date Published: 11 August 1995
PDF: 14 pages
Proc. SPIE 2537, Novel Optical Systems Design and Optimization, (11 August 1995); doi: 10.1117/12.216390
Show Author Affiliations
Paul E. Nothnagle, Amarel Precision Instruments (United States)
John Robert Zinter, Amarel Precision Instruments (United States)
Paul L. Ruben

Published in SPIE Proceedings Vol. 2537:
Novel Optical Systems Design and Optimization
Jose M. Sasian, Editor(s)

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