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Proceedings Paper

Progress in ion figuring large optics
Author(s): Lynn N. Allen
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Paper Abstract

Ion figuring is an optical fabrication method that provides deterministic surface figure error correction of previously polished surfaces by using a directed, inert, and neutralized ion beam to physically sputter material from the optic surface. Considerable process development has been completed and numerous large optical elements have been successfully final-figured using this process. The process has been demonstrated to be highly deterministic, capable of completing complex-shaped optical element configurations in only a few process iterations, and capable of achieving high- quality surface figure accuracies. A review of the neutral ion beam figuring process will be provided, along with discussion of processing results for several large optics. Most notably, processing of Keck 10 meter telescope primary mirror segments and correction of one other large optic where a convergence ratio greater than 50 was demostrated during the past year will be discussed. Also, the process has been demonstrated on various optical materials, including fused silica, ULE, zerodur, silicon, and chemically vapor deposited (CVD) silicon carbide. Where available, results of surface finish changes caused by the ion bombardment process will be discussed. Most data have shown only limited degradation of the optic surface finish, and that it is generally a function of the quality of mechanical polishing prior to ion figuring. Removals of from 5 to 10 micrometers on some materials are acceptable without adversely altering the surface finish specularity.

Paper Details

Date Published: 14 July 1995
PDF: 11 pages
Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213776
Show Author Affiliations
Lynn N. Allen, Eastman Kodak Co. (United States)


Published in SPIE Proceedings Vol. 2428:
Laser-Induced Damage in Optical Materials: 1994
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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