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Proceedings Paper

Comparison of laser-induced damage morphology in three model thin-film systems: HfO2, Y2O3, and Ta2O5
Author(s): Semyon Papernov; Ansgar W. Schmid
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Paper Abstract

Post-mortem atomic force mocroscopy (AFM) analysis of 1 micrometers thick, monolayer, delectric coatings of HfO2, Y2O3, and Ta2O5 , all prepared by conventional e-beam deposition, was carried out on irradiated sites of moderate-level damage after 1054-nm irradiation by identical laser pulses. Analysis of all maps shows that growth nodules, long believed to be the prime laser-damage drivers, are few in all of our films and are irrelevant to damage here. Damage morphology was represented by micrometer-scale craters and domes. Crater sizes and depths, linked to the sizes and positions of absorbing defects in the film media, indicate that average absorber size increases from HfO2 to Y2O3 to Ta2O5. HFO2 also has the shallowest craters, while Ta2O5 samples consistently damage near the film- substrate interface, with yttria falling in between these extremes. Crater cross sections reveal a predominance of conical wall formations, pointing towards a thermal- explosion mechanism of crater formation. Domes that were found to be entirely absent in Ta2O5, occur with approximately 2% probablility in Y2O3, i.e., 2% of all mapped defects were domes with more than 25% probablility in HfO2 films. Obtained results suggest that domes are crater precursors, i.e., arrested damage events because of lack of sufficient energy transfer from the absorbing inclusion.

Paper Details

Date Published: 14 July 1995
PDF: 12 pages
Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213756
Show Author Affiliations
Semyon Papernov, Univ. of Rochester (United States)
Ansgar W. Schmid, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 2428:
Laser-Induced Damage in Optical Materials: 1994
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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