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Proceedings Paper

Silica with high resistance to excimer laser
Author(s): Akira Fujinoki
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Paper Abstract

Optical property changes of newly developed silica by both KrF and ArF excimer laser irradiation will be reported. X-2-01 has been provided for high power laser application for several years and has proved its high performance against KrF laser irradiation. The new material X-1-04 shows superior optical stability in transmittance and refractive index change by KrF and ArF laser irradiation. The application of these materials will be discussed considering their properties of geometry, homogeneity, and laser resistance.

Paper Details

Date Published: 14 July 1995
PDF: 4 pages
Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213752
Show Author Affiliations
Akira Fujinoki, Shin-Etsu Quartz Products Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2428:
Laser-Induced Damage in Optical Materials: 1994
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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