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Proceedings Paper

Laser-induced damage in optical materials under UV excimer laser radiation
Author(s): Nikolay V. Morozov
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Paper Abstract

The studies of laser damage resistance of silica glass and fluoride crystals performed at ArF, KrF, and XeF excimer laser wavelengths with a pulse duration of approximately 80 ns have given the following data: the dependence of the bulk damage threshold on irradiated spot size, ranging in value from 6 to 1200 micrometers ; temperature dependence of laser damage resistance; the influence of metal admixtures on damage threshold; the influence of ionizing radiation on damage resistance; the coefficients of nonlinear absorption; frequency dependence of the bulk damage threshold for silica glass in the UV region.

Paper Details

Date Published: 14 July 1995
PDF: 17 pages
Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213751
Show Author Affiliations
Nikolay V. Morozov, P.N. Lebedev Physical Institute (Russia)

Published in SPIE Proceedings Vol. 2428:
Laser-Induced Damage in Optical Materials: 1994
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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