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Proceedings Paper

Development of plasma-enhanced CVD for multilayer mirror coatings (Abstract Only)
Author(s): Carl B. Freidhoff; Harry Buhay; William D. Partlow; Donald L. Decker; Karl A. Klemm
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Paper Abstract

PECVD is an attractive technique for depositing coatings of refractory optical materials because of the ability to control composition (to assure low absorption), the low substrate temperature required, and the high deposition rate attainable. Deposition processes have been established that achieve thin films with low absorption, low scatter, good thickness uniformity, and environmental durability. Multilayer dielectric- enhanced IR reflectance mirrors using a variety of silicon-based refractory materials have been fabricated and evaluated. Results of optical and physical characterizations and environmental testing will be presented.

Paper Details

Date Published: 14 July 1995
PDF: 2 pages
Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); doi: 10.1117/12.213717
Show Author Affiliations
Carl B. Freidhoff, Westinghouse Science and Technology Ctr. (United States)
Harry Buhay, Westinghouse Science and Technology Ctr. (United States)
William D. Partlow, Westinghouse Science and Technology Ctr. (United States)
Donald L. Decker, Naval Air Warfare Ctr. (United States)
Karl A. Klemm, Naval Air Warfare Ctr. (United States)


Published in SPIE Proceedings Vol. 2428:
Laser-Induced Damage in Optical Materials: 1994
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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