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Proceedings Paper

Mask technology for 0.25-um lithography and beyond
Author(s): Fu-Chang Lo; David H. Hwang; Giang T. Dao; Jeff N. Farnsworth; Wayne Rawlins; Rosanne LaVoy; Jim DeWitt; Rahul Goyal; Gang Liu; Susan V. Daugherty
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Paper Details

Date Published: 27 June 1995
PDF: 27 pages
Proc. SPIE TTS4, Technologies for Microlithography Manufacturing, (27 June 1995); doi: 10.1117/12.213213
Show Author Affiliations
Fu-Chang Lo, Intel Corp. (United States)
David H. Hwang, Intel Corp. (United States)
Giang T. Dao, Intel Corp. (United States)
Jeff N. Farnsworth, Intel Corp. (United States)
Wayne Rawlins, Intel Corp. (United States)
Rosanne LaVoy, Intel Corp. (United States)
Jim DeWitt, Intel Corp. (United States)
Rahul Goyal, Intel Corp. (United States)
Gang Liu, Intel Corp. (United States)
Susan V. Daugherty, Intel Corp. (United States)


Published in SPIE Proceedings Vol. TTS4:
Technologies for Microlithography Manufacturing

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