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Proceedings Paper

Pellicle versus influence of clean-room environments
Author(s): Naofumi Inoue; Hiroaki Nakagawa; Masahiro Kondou; Masanari Kitajima
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Paper Abstract

LSI Technology is experiencing a steady development from half micrometers to quarter micrometers generations. With this development, quality control is becoming more severe. Therefore, the level of quality required for dust proof pellicles is getting higher. As the line width of devices narrows, the quality and function of pellicles by the conventional method has become insufficient. In order to cope with the finer line width, the influence of clean room environments on pellicles should be understood, and some cautions should be noted. In this paper, three issues of the environmental influence are discussed. For each issue, its nature, possible adverse effects, and some recommendations are presented respectively.

Paper Details

Date Published: 3 July 1995
PDF: 14 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212814
Show Author Affiliations
Naofumi Inoue, Mitsui Petrochemical Industries, Ltd. (Japan)
Hiroaki Nakagawa, Mitsui Petrochemical Industries, Ltd. (Japan)
Masahiro Kondou, Mitsui Petrochemical Industries, Ltd. (Japan)
Masanari Kitajima, Mitsui Petrochemical Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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