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Proceedings Paper

State of the art in focused ion-beam mask repair systems
Author(s): Diane K. Stewart; John A. Doherty; Andrew F. Doyle; John C. Morgan
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Paper Abstract

Focused ion beam (FIB) systems are commonly used to repair lithographic masks with features below one micron. We will summarize the development of focused ion beam mask repair systems starting from the original tools developed for photomasks approximately 10 years ago. The present state of the art in FIB mask repair systems is incorporated in two types of tools-one for repair of proximity print X-ray masks, and the other for repair of photomasks and some phase shift masks. Similarities of the two styles of systems include the gallium ion optics, the lithographic stage for accurate positioning, a thermal enclosure to minimize system drift, deflection and scanning electronics, and an interface to inspection data. The differences include the process chemistries, repair strategies, and imaging techniques. Examples of a variety of repaired defects on both X-ray and phase shift masks will be shown. Advanced masks such as those for EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), and SCALPEL (Scattering with Angular Limitation in Projection Electron Lithography) will have to be repaired should those technologies mature, and presumably with FIB tools. Preliminary research and development of advanced mask repair problems will be described and possible approaches will be suggested.

Paper Details

Date Published: 3 July 1995
PDF: 14 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212805
Show Author Affiliations
Diane K. Stewart, Micrion Corp. (United States)
John A. Doherty, Micrion Corp. (United States)
Andrew F. Doyle, Micrion Corp. (United States)
John C. Morgan, Micrion Corp. (United States)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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