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Proceedings Paper

Fast-resist image estimation methodology using light-intensity distribution
Author(s): Keisuke Tsudaka; Manabu Tomita; Minoru Sugawara; Hiroichi Kawahira; Satoru Nozawa
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Paper Abstract

A fast resist image estimation methodology using light intensity distribution is proposed. Recently, some optical proximity effect correction (OPC) methods have been developed. Conventionally, to apply light intensity simulation of OPC, resist image has been simply estimated as a contour at which light intensity distribution is sliced. However, it is difficult to obtain a real resist image with this conventional method because of no consideration of actual resist process. Now, we have developed a new method which can estimate resist image with simple approximate calculation of light intensity distribution. In this method, resist image can be calculated from light intensity distribution using convolution. Using this method, calculation accuracy can be improved twice compared to that with a conventional light intensity slicing method. In this paper, the method is described in detail, then its feasibility to be applied to OPC will be demonstrated.

Paper Details

Date Published: 3 July 1995
PDF: 12 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212804
Show Author Affiliations
Keisuke Tsudaka, Sony Corp. (Japan)
Manabu Tomita, Sony Corp. (Japan)
Minoru Sugawara, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)
Satoru Nozawa, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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