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Proceedings Paper

Current technological status of spatial filtering method for soft defect detection
Author(s): Tsuneyuki Hagiwara
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Paper Abstract

Laser-based mask inspection systems are indispensable to attaining better yield, in both the semiconductor manufacturing process and the mask manufacturing process, because of their high throughput. We describe this issue citing the operational principle of our AM-601D (A reticle particle inspection system that we manufacture, rated sensitivity: 0.5 micron), which is based on a spatial filtering method with a raster scanning of a focused laser beam.

Paper Details

Date Published: 3 July 1995
PDF: 12 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212796
Show Author Affiliations
Tsuneyuki Hagiwara, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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