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Proceedings Paper

Lithographic performance of SiNx single-layer halftone mask
Author(s): Kenji Kawano; Masafumi Asano; Satoshi Tanaka; Takayuki Iwamatsu; Hiroyuki Sato; Shinichi Ito
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Paper Abstract

An aging process that makes SiNx single-layer halftone film stable for DUV (248 nm) exposure has been established. The light irradiation with a low pressure mercury lamp was used to age the SiNx halftone film from the tendency of the transmittance change caused by the DUV exposure. Taking account of the optical constants shift during aging process, a SiNx halftone film with transmittance T equals 9.3%, phase shift angle (theta) equals 178 degrees was obtained. At the SiNx film, no transmittance change was observed after 2800 J/cm2 DUV exposure. Using the mask, 0.2 micrometers hole patterns were obtained with above 1.0 micrometers depth of focus (DOF).

Paper Details

Date Published: 3 July 1995
PDF: 8 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212784
Show Author Affiliations
Kenji Kawano, Toshiba Research and Development Ctr. (Japan)
Masafumi Asano, Toshiba Research and Development Ctr. (Japan)
Satoshi Tanaka, Toshiba Research and Development Ctr. (Japan)
Takayuki Iwamatsu, Toshiba Research and Development Ctr. (Japan)
Hiroyuki Sato, Toshiba Research and Development Ctr. (Japan)
Shinichi Ito, Toshiba Research and Development Ctr. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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