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Proceedings Paper

Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure
Author(s): Koichi Mikami; Hiroshi Mohri; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
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Paper Abstract

We had developed an attenuated phase shift mask for DUV exposure (DUV- AttPSM) using a CrFx film as a phase shifting layer. But the durability against DUV irradiation was poor (ca. 0.8% transmittance increase after 37 kJ/cm2). In addition, an exposure test proved that the phase shift angle of the DUV-AttPSM was 170 degrees. We improved the durability against DUV irradiation of our DUV-AttPSM by changing the deposition conditions. The transmittance change after 37 kJ/cm2 irradiation is reduced to 0.15%. The improved film shows acceptable durability against chemicals, and there is no problem in the mask- cleaning process. Furthermore, we evaluated the exposure properties of a DUV-AttPSM with a phase-shift angle of ca. 180 degrees, and the focus latitude for a 0.25 micrometers hole array turns out to be 2.5 micrometers , being 5- times as large as that of a binary mask. In addition, the consecutive deposition stability of the blank was tested, and the DUV-AttPSM proved to be adaptable to mass production.

Paper Details

Date Published: 3 July 1995
PDF: 10 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212782
Show Author Affiliations
Koichi Mikami, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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