Share Email Print
cover

Proceedings Paper

Evaluation of CD metrology tools for photomasks for 0.25-μm devices
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

CD measurement tools to reticles for 0.25 micrometers devices are evaluated in light of the follow requirements: (1) linearity limit (or reliably measurable minimum feature size): 0.5 micrometers , (2) repeatability (3(sigma) ): less than or equal to 6 nm, (3) applicability to attenuated (or half tone) masks, and (4) automeasurement capability assisted with pattern recognition. The evaluated tools are (1) an optical CD measurement system Nikon MPA3 at g-line or e-line light, (2) a laser confocal microscope OAI SiSCANII7325 at 325 nm, and (3) a confocal- /transmission-type microscope Technical Instruments Co. KMS300T in a confocal or transmission mode with board-band illumination. The samples evaluated are (1) a low-reflective binary mask, (2) a HT mask for g-line exposure with a transmittance of 8%, and (3) a HT mask for i-line exposure with a transmittance of 8%, all having space patterns the width of which varies from 0.45 to 4.0 micrometers . In conclusion, the requirements are met by the confocal microscopes (SiSCANII7325 and KMS300T in a confocal mode).

Paper Details

Date Published: 3 July 1995
PDF: 11 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212780
Show Author Affiliations
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Shiho Sasaki, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

© SPIE. Terms of Use
Back to Top