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Proceedings Paper

Analysis of pattern shift error for mask clamping measured by Nikon XY-31
Author(s): Shusuke Yoshitake; Kazuto Matsuki; Satoshi Yamasaki; Ryoichi Hirano; Shuichi Tamamushi; Yoji Ogawa; Toru Tojo
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Paper Abstract

Pattern measurement repeatability of metrology tools must be evaluated precisely to warrant higher pattern placement accuracy, according to a budget of pattern shift errors effected by the initial deformation of a substrate, clamping conditions, etc. As first steps, we focused on our metrology tool, Nikon XY-3i. Pattern measurement repeatability was usually evaluated to measure a referential pattern of a single mask repeatedly. For taking tilting variations on each of mask setting into account, we divided the coordinates of measured data into some error factors. Besides, we proposed sag correction method to eliminate tilting variation for precisely evaluation. This method was effective to unify each of the referential planes on measuring. Sag correction was effective to diminish in variations of orthogonality error factor and trapezoid error factors and deviations (3(sigma) ) of measurement repeatability. Therefore, we succeeded to get the quantitative budget of measurement repeatability for our metrology tool.

Paper Details

Date Published: 3 July 1995
PDF: 11 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212777
Show Author Affiliations
Shusuke Yoshitake, Toshiba Corp. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Satoshi Yamasaki, Toshiba Corp. (Japan)
Ryoichi Hirano, Toshiba Corp. (Japan)
Shuichi Tamamushi, Toshiba Corp. (Japan)
Yoji Ogawa, Toshiba Corp. (Japan)
Toru Tojo, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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