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Proceedings Paper

Surface profile measurement of thin film using phase-shifting interferometry
Author(s): Yiping Xu; Yuanjing Li
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Paper Abstract

Current optical interferometric methods for reconstructing 3D surface profiles of thin films from phase measurements are often inaccurate because of the effects of phase changes on reflection. A new method has been developed that automatically determines the film thickness and reconstructs the surface profile of thin films from conventional interferometric phase measurements. This method uses known optical constants of the materials that compose the test surface. By measuring the film thickness at each point of the test surface, a 3D surface profile can be reconstructed. Experimental results are presented for a set of thin film standards consisting of SiO2 film on silicon substrate. The thin film thickness determined using this method is within the uncertainty certified by the standard manufacturer.

Paper Details

Date Published: 23 June 1995
PDF: 11 pages
Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); doi: 10.1117/12.212652
Show Author Affiliations
Yiping Xu, WYKO Corp. (United States)
Yuanjing Li, WYKO Corp. (United States)


Published in SPIE Proceedings Vol. 2545:
Interferometry VII: Applications
Ryszard J. Pryputniewicz; Gordon M. Brown; Werner P. O. Jueptner, Editor(s)

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