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Proceedings Paper

Low-threshold multiwavelength VCSEL arrays fabricated by nonplanar MOCVD
Author(s): Fumio Koyama; Toshikazu Mukaihara; Yukio Hayashi; Noriyuki Ohnoki; Nobuaki Hatori; Kenichi Iga
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Paper Abstract

A novel approach of on-wafer wavelength control for vertical cavity surface emitting lasers (VCSELs) is proposed using nonplanar metalorganic chemical vapor deposition. The resonant wavelength of 980nm VCSELs grown on a patterned substrate can be controlled in the wavelength range over 45nm by changing the size of circular patterns. We have fabricated linear and 2D multiwavelength vertical surface emitting laser (VCSEL) arrays fabricated by using this technique. The threshold of multi-wavelength VCSELs formed on the patterned substrate is as low as 3 mA. A possibility of an extremely large wavelength span for multi- wavelength arrays will be discussed. The proposed method will be useful for multi-wavelength VCSEL arrays as well as for the cancellation of wavelength nonuniformity across a wafer.

Paper Details

Date Published: 19 June 1995
PDF: 7 pages
Proc. SPIE 2399, Physics and Simulation of Optoelectronic Devices III, (19 June 1995); doi: 10.1117/12.212535
Show Author Affiliations
Fumio Koyama, Tokyo Institute of Technology (Japan)
Toshikazu Mukaihara, Tokyo Institute of Technology (Japan)
Yukio Hayashi, Tokyo Institute of Technology (Japan)
Noriyuki Ohnoki, Tokyo Institute of Technology (Japan)
Nobuaki Hatori, Tokyo Institute of Technology (Japan)
Kenichi Iga, Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 2399:
Physics and Simulation of Optoelectronic Devices III
Marek Osinski; Weng W. Chow, Editor(s)

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